Sputtering and redeposition of ion irradiated Au nanoparticle arrays : direct comparison of simulations to experiments

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dc.contributor.author Holland-Moritz, Henry
dc.contributor.author Ilinov, Andrey
dc.contributor.author Djurabekova, Flyura
dc.contributor.author Nordlund, Kai
dc.contributor.author Ronning, Carsten
dc.date.accessioned 2017-04-07T21:16:18Z
dc.date.available 2017-04-07T21:16:18Z
dc.date.issued 2017-01-20
dc.identifier.citation Holland-Moritz , H , Ilinov , A , Djurabekova , F , Nordlund , K & Ronning , C 2017 , ' Sputtering and redeposition of ion irradiated Au nanoparticle arrays : direct comparison of simulations to experiments ' , New Journal of Physics , vol. 19 , 013023 . https://doi.org/10.1088/1367-2630/aa56eb
dc.identifier.other PURE: 82259453
dc.identifier.other PURE UUID: 72b7ea62-a9e6-4bdf-8d9f-0419b91be495
dc.identifier.other WOS: 000394535700003
dc.identifier.other Scopus: 85011371223
dc.identifier.other ORCID: /0000-0002-5828-200X/work/31551665
dc.identifier.other ORCID: /0000-0001-6244-1942/work/31551711
dc.identifier.uri http://hdl.handle.net/10138/178863
dc.description.abstract Ion beam processing of surfaces is well known to lead to sputtering, which conventionally is associated only with erosion of atoms from the material. We show here, by combination of experiments and a newly developed Monte Carlo algorithm, that in the case of nanoparticles in a regular two-dimensional array on surfaces, the redeposition of sputtered atoms may play a significant role on the system development. The simulations are directly compared to in situ experiments obtained using a dual focused Ga+ ion beam system and high resolution scanning electron microscopy, and explain the size evolution by a combination of sputtering and redeposition of sputtered material on neighboring particles. The effect is found to be dependent on the size of the nanoparticles: if the nanoparticle size is comparable to the ion range, the reposition is negligible. For larger nanoparticles the redeposition becomes significant and is able to compensate up to 20% of the sputtered material, effectively reducing the process of sputtering. The redeposition may even lead to significant growth: this was seen for the nanoparticles with the sizes much smaller than the ion range. Furthermore, the algorithm shows that significant redeposition is possible when the large size neighboring nanoparticles are present. en
dc.format.extent 11
dc.language.iso eng
dc.relation.ispartof New Journal of Physics
dc.rights cc_by
dc.rights.uri info:eu-repo/semantics/openAccess
dc.subject sputtering
dc.subject redeposition
dc.subject ion beam modification
dc.subject nanoparticles
dc.subject BEAM EROSION
dc.subject MONTE-CARLO
dc.subject NANOSTRUCTURES
dc.subject FILMS
dc.subject CODE
dc.subject 114 Physical sciences
dc.title Sputtering and redeposition of ion irradiated Au nanoparticle arrays : direct comparison of simulations to experiments en
dc.type Article
dc.contributor.organization Department of Physics
dc.description.reviewstatus Peer reviewed
dc.relation.doi https://doi.org/10.1088/1367-2630/aa56eb
dc.relation.issn 1367-2630
dc.rights.accesslevel openAccess
dc.type.version publishedVersion

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