Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

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Kalam , K , Seemen , H , Ritslaid , P , Rähn , M , Tamm , A , Kukli , K , Kasikov , A , Link , J , Stern , R , Duenas , S , Castan , H & Garcia , H 2018 , ' Atomic layer deposition and properties of ZrO2/Fe2O3 thin films ' , Beilstein journal of nanotechnology , vol. 9 , pp. 119-128 . https://doi.org/10.3762/bjnano.9.14

Title: Atomic layer deposition and properties of ZrO2/Fe2O3 thin films
Author: Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Duenas, Salvador; Castan, Helena; Garcia, Hector
Contributor: University of Helsinki, Department of Chemistry
Date: 2018-01-10
Language: eng
Number of pages: 10
Belongs to series: Beilstein journal of nanotechnology
ISSN: 2190-4286
URI: http://hdl.handle.net/10138/232241
Abstract: Thin solid films consisting of ZrO2 and Fe2O3 were grown by atomic layer deposition (ALD) at 400 degrees C. Metastable phases of ZrO2 were stabilized by Fe2O3 doping. The number of alternating ZrO2 and Fe2O3 deposition cycles were varied in order to achieve films with different cation ratios. The influence of annealing on the composition and structure of the thin films was investigated. Additionally, the influence of composition and structure on electrical and magnetic properties was studied. Several samples exhibited a measurable saturation magnetization and most of the samples exhibited a charge polarization. Both phenomena were observed in the sample with a Zr/Fe atomic ratio of 2.0.
Subject: atomic layer deposition
metal oxides
thin films
ZIRCONIUM DIOXIDE
STABILIZED ZIRCONIA
MAGNETIC-PROPERTIES
IRON-OXIDE
ZRO2
GROWTH
NANOSTRUCTURES
TETRACHLORIDE
DEGRADATION
TEMPERATURE
221 Nano-technology
116 Chemical sciences
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