Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides

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Seemen , H , Rähn , M , Kalam , K , Sajavaara , T , Duenas , S , Castan , H , Link , J , Stern , R , Kukli , K & Tamm , A 2018 , ' Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides ' , ECS Journal of Solid State Science and Technology , vol. 7 , no. 8 , pp. P402-P409 . https://doi.org/10.1149/2.0191808jss

Title: Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides
Author: Seemen, Helina; Rähn, Mihkel; Kalam, Kristjan; Sajavaara, Timo; Duenas, Salvador; Castan, Helena; Link, Joosep; Stern, Raivo; Kukli, Kaupo; Tamm, Aile
Contributor: University of Helsinki, Department of Chemistry
Date: 2018-07-28
Language: eng
Number of pages: 8
Belongs to series: ECS Journal of Solid State Science and Technology
ISSN: 2162-8769
URI: http://hdl.handle.net/10138/239084
Abstract: Five-layer crystalline thin film structures were formed, consisting of ZrO2 and Co3O4 alternately grown on Si(100) substrates by atomic layer deposition at 300 degrees C using ZrCl4 and Co(acac)(3) as the metal precursors and ozone as the oxygen precursor. The performance of the laminate films was dependent on the relative content of constituent oxide layers. The magnetization in these films was nonlinear, saturative, and with very weak coercive fields. Electrical measurements revealed the formation of significant polarization versus external field loops and implied some tendency toward memristive behavior. (C) The Author(s) 2018. Published by ECS.
Subject: CHEMICAL-VAPOR-DEPOSITION
ZRO2 THIN-FILMS
THERMAL BARRIER COATINGS
GAS SENSORS
LASER DEPOSITION
SPRAY-PYROLYSIS
BUFFER LAYER
CO3O4 FILMS
DIELECTRICS
SILICON
221 Nano-technology
116 Chemical sciences
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