Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films
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dc.contributor.author |
Tamm, Aile |
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dc.contributor.author |
Kalam, Kristjan |
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dc.contributor.author |
Seemen, Helina |
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dc.contributor.author |
Kozlova, Jekaterina |
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dc.contributor.author |
Kukli, Kaupo |
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dc.contributor.author |
Aarik, Jaan |
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dc.contributor.author |
Link, Joosep |
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dc.contributor.author |
Stern, Raivo |
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dc.contributor.author |
Duenas, Salvador |
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dc.contributor.author |
Castan, Helena |
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dc.date.accessioned |
2019-02-15T11:17:01Z |
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dc.date.available |
2019-02-15T11:17:01Z |
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dc.date.issued |
2017-12 |
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dc.identifier.citation |
Tamm , A , Kalam , K , Seemen , H , Kozlova , J , Kukli , K , Aarik , J , Link , J , Stern , R , Duenas , S & Castan , H 2017 , ' Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films ' , ACS Omega , vol. 2 , no. 12 , pp. 8836-8842 . https://doi.org/10.1021/acsomega.7b01394 |
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dc.identifier.other |
PURE: 122355774 |
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dc.identifier.other |
PURE UUID: bae7128f-7266-497a-9a6d-292eb571c6dc |
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dc.identifier.other |
WOS: 000418744400035 |
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dc.identifier.uri |
http://hdl.handle.net/10138/299106 |
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dc.description.abstract |
Mixed films of a high-permittivity oxide, Er2O3, and a magnetic material, Fe2O3, were grown by atomic layer deposition on silicon and titanium nitride at 375 degrees C using erbium diketonate, ferrocene, and ozone as precursors. Crystalline phases of erbium and iron oxides were formed. Growth into three-dimensional trenched structures was demonstrated. A structure deposited using tens to hundreds subsequent cycles for both constituent metal oxide layers promoted both charge polarization and saturative magnetization compared to those in the more homogeneously mixed films. |
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dc.format.extent |
7 |
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dc.language.iso |
eng |
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dc.relation.ispartof |
ACS Omega |
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dc.rights |
other |
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dc.rights.uri |
info:eu-repo/semantics/openAccess |
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dc.subject |
ERFE2O4 |
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dc.subject |
GROWTH |
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dc.subject |
116 Chemical sciences |
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dc.title |
Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films |
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dc.type |
Article |
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dc.contributor.organization |
Department |
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dc.description.reviewstatus |
Peer reviewed |
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dc.relation.doi |
https://doi.org/10.1021/acsomega.7b01394 |
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dc.relation.issn |
2470-1343 |
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dc.rights.accesslevel |
openAccess |
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dc.type.version |
publishedVersion |
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