Atomic layer deposited protective layers

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Leskelä , M , Salmi , E & Ritala , M 2017 , ' Atomic layer deposited protective layers ' , Materials Science Forum , vol. 879 , pp. 1086-1092 .

Title: Atomic layer deposited protective layers
Author: Leskelä, M.; Salmi, E.; Ritala, M.
Contributor organization: Department
Doctoral Programme in Chemistry and Molecular Sciences
Doctoral Programme in Materials Research and Nanosciences
Mikko Ritala / Principal Investigator
Date: 2017
Language: eng
Number of pages: 7
Belongs to series: Materials Science Forum
ISSN: 0255-5476
Abstract: This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings. In protective coatings oxides are the most common materials and especially Al, Ti, and Ta oxides have been applied. The use of nanolaminates enables improving the protection properties. Since ALD films are pinhole-free and often thin they are used to protect against moisture, radiation, out-gassing but not often against corrosion of metals. Very good moisture barriers are obtained with thin ALD oxide layers on polymers and cardboard. This property is also very attractive in encapsulation of OLEDs. In studies of energy technology materials protection of electrodes in Li-ion batteries, fuel cells and supercapacitors by ALD has been reported and significant improvement in the stability has been achieved. Yet another area is protection of silver jewelry from tarnishing by a thin oxide layer. In traditional corrosion protection of metals ALD films have proven to be useful in tailoring of interfaces and sealing of defects in coatings made by other techniques. © 2017 Trans Tech Publications, Switzerland.
Subject: Aluminum coatings
Corrosion protection
Fuel cells
Interfaces (materials)
Lithium-ion batteries
Protective coatings
Tantalum oxides
Titanium oxides, Atomic layer deposited
Common materials
Corrosion coatings
Energy technologies
Moisture barriers
Protective layers
Thin oxide layers, Atomic layer deposition
116 Chemical sciences
Peer reviewed: Yes
Usage restriction: openAccess
Self-archived version: acceptedVersion

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