Plasma etched carbon microelectrode arrays for bioelectrical measurements

Show full item record



Heikkinen , J J , Kaarela , T , Ludwig , A , Sukhanova , T , Khakipoor , S , Kim , S I , Han , J G , Huttunen , H J , Rivera , C , Lauri , S E , Taira , T , Jokinen , V & Franssila , S 2018 , ' Plasma etched carbon microelectrode arrays for bioelectrical measurements ' , Diamond and Related Materials , vol. 90 , pp. 126-134 .

Title: Plasma etched carbon microelectrode arrays for bioelectrical measurements
Author: Heikkinen, Joonas J.; Kaarela, Tiina; Ludwig, Anastasia; Sukhanova, Tatiana; Khakipoor, Shokoufeh; Kim, Sung Il; Han, Jeon Geon; Huttunen, Henri J.; Rivera, Claudio; Lauri, Sari E.; Taira, Tomi; Jokinen, Ville; Franssila, Sami
Contributor organization: Veterinary Biosciences
Doctoral Programme in Clinical Veterinary Medicine
Doctoral Programme in Drug Research
Doctoral Programme in Biomedicine
Doctoral Programme Brain & Mind
Henri Juhani Huttunen / Principal Investigator
University Management
Neuroscience Center
Helsinki In Vivo Animal Imaging Platform (HAIP)
Doctoral Programme in Integrative Life Science
Claudio Rivera Baeza / Principal Investigator
Molecular and Integrative Biosciences Research Programme
Syn­aptic Plas­ti­city and De­vel­op­ment
Physiology and Neuroscience (-2020)
Synaptic Plasticity and Neuronal Synchronization
Tomi Taira / Principal Investigator
Date: 2018-11
Language: eng
Number of pages: 9
Belongs to series: Diamond and Related Materials
ISSN: 0925-9635
Abstract: Carbon-based materials have attracted much attention in biological applications like interfacing electrodes with neurons and cell growth platforms due to their natural biocompatibility and tailorable material properties. Here we have fabricated sputtered carbon thin film electrodes for bioelectrical measurements. Reactive ion etching (RIE) recipes were optimized with Taguchi method to etch the close field unbalanced magnetron sputtered carbon thin film (nanocarbon, nC) consisting of nanoscale crystalline sp(2)-domains in amorphous sp(3)-bonded backbone. Plasma etching processes used gas mixtures of Ar/O-2/SF6/CHF3 for RIE and O-2/SF6 for ICP-RIE. The highest achieved etch rate for nanocarbon was >> 389 nm/min and best chromium etch mask selectivity was 135:1. Biocompatibility of the material was tested with rat neuronal cultures. Next, we fabricated multielectrode arrays (MEA) with carbon recording electrodes and metal wiring. Organotypic brain slices grown on the MEAs were viable and showed characteristic spontaneous electrical network activity. The results demonstrate that interactions with nanocarbon substrate support neuronal survival and maturation of functional neuronal networks. Thus the material can have wide applications in biomedical research.
Subject: Carbon
Reactive ion etching
Multielectrode array
Neuronal networks
114 Physical sciences
Peer reviewed: Yes
Rights: cc_by_nc_nd
Usage restriction: openAccess
Self-archived version: acceptedVersion

Files in this item

Total number of downloads: Loading...

Files Size Format View
Heikkinen_2018_accepted_manuscript_1.pdf 22.55Mb PDF View/Open

This item appears in the following Collection(s)

Show full item record