Plasma etched carbon microelectrode arrays for bioelectrical measurements

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Heikkinen , J J , Kaarela , T , Ludwig , A , Sukhanova , T , Khakipoor , S , Kim , S I , Han , J G , Huttunen , H J , Rivera , C , Lauri , S E , Taira , T , Jokinen , V & Franssila , S 2018 , ' Plasma etched carbon microelectrode arrays for bioelectrical measurements ' , Diamond and Related Materials , vol. 90 , pp. 126-134 .

Title: Plasma etched carbon microelectrode arrays for bioelectrical measurements
Author: Heikkinen, Joonas J.; Kaarela, Tiina; Ludwig, Anastasia; Sukhanova, Tatiana; Khakipoor, Shokoufeh; Kim, Sung Il; Han, Jeon Geon; Huttunen, Henri J.; Rivera, Claudio; Lauri, Sari E.; Taira, Tomi; Jokinen, Ville; Franssila, Sami
Contributor: University of Helsinki, Veterinary Biosciences
University of Helsinki, Ecole Normale Super, PSL Research University Paris (ComUE), Centre National de la Recherche Scientifique (CNRS), Institut National de la Sante et de la Recherche Medicale (Inserm), Ecole Normale Superieure (ENS), CNRS - National Institute for Biology (INSB), Inst Biol IBENS, Paris Sci & Lettres, CNRS,UMR 8197,Inserm 1024
University of Helsinki, Doctoral Programme in Drug Research
University of Helsinki, Helsinki In Vivo Animal Imaging Platform (HAIP)
University of Helsinki, Molecular and Integrative Biosciences Research Programme
University of Helsinki, Doctoral Programme in Clinical Veterinary Medicine
University of Helsinki, Aalto University
Date: 2018-11
Language: eng
Number of pages: 9
Belongs to series: Diamond and Related Materials
ISSN: 0925-9635
Abstract: Carbon-based materials have attracted much attention in biological applications like interfacing electrodes with neurons and cell growth platforms due to their natural biocompatibility and tailorable material properties. Here we have fabricated sputtered carbon thin film electrodes for bioelectrical measurements. Reactive ion etching (RIE) recipes were optimized with Taguchi method to etch the close field unbalanced magnetron sputtered carbon thin film (nanocarbon, nC) consisting of nanoscale crystalline sp(2)-domains in amorphous sp(3)-bonded backbone. Plasma etching processes used gas mixtures of Ar/O-2/SF6/CHF3 for RIE and O-2/SF6 for ICP-RIE. The highest achieved etch rate for nanocarbon was >> 389 nm/min and best chromium etch mask selectivity was 135:1. Biocompatibility of the material was tested with rat neuronal cultures. Next, we fabricated multielectrode arrays (MEA) with carbon recording electrodes and metal wiring. Organotypic brain slices grown on the MEAs were viable and showed characteristic spontaneous electrical network activity. The results demonstrate that interactions with nanocarbon substrate support neuronal survival and maturation of functional neuronal networks. Thus the material can have wide applications in biomedical research.
Subject: Carbon
Reactive ion etching
Multielectrode array
Neuronal networks
114 Physical sciences

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