Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species

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dc.contributor.author Jamnig, Andreas
dc.contributor.author Pliatsikas, Nikolaos
dc.contributor.author Abadias, Gregory
dc.contributor.author Sarakinos, Kostas
dc.date.accessioned 2022-07-20T12:19:01Z
dc.date.available 2022-07-20T12:19:01Z
dc.date.issued 2022-05
dc.identifier.citation Jamnig , A , Pliatsikas , N , Abadias , G & Sarakinos , K 2022 , ' Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species ' , Journal of vacuum science & technology : an official journal of the American Vacuum Society , vol. 40 , no. 3 , 033407 . https://doi.org/10.1116/6.0001700
dc.identifier.other PURE: 216761911
dc.identifier.other PURE UUID: 2699a12b-9c63-4569-a66d-5b723763f018
dc.identifier.other WOS: 000795077500002
dc.identifier.other Scopus: 85128763077
dc.identifier.other ORCID: /0000-0003-2864-9509/work/115907273
dc.identifier.uri http://hdl.handle.net/10138/346310
dc.description.abstract We demonstrate a versatile concept for manipulating morphology of thin (& LE;25 nm) noble-metal films on weakly interacting substrates using growth of Ag on SiO2 as a model system. The concept entails deployment of minority metallic (Cu, Au, Al, Ti, Cr, and Mo) alloying species at the Ag-layer growth front. Data from in situ and real-time monitoring of the deposition process show that all alloying agents-when deployed together with Ag vapor throughout the entire film deposition-favor two-dimensional (2D) growth morphology as compared to pure Ag film growth. This is manifested by an increase in the substrate area coverage for a given amount of deposited material in discontinuous layers and a decrease of the thickness at which a continuous layer is formed, though at the expense of a larger electrical resistivity. Based on ex situ microstructural analyses, we conclude that 2D morphological evolution under the presence of alloying species is predominantly caused by a decrease of the rate of island coalescence completion during the initial film-formation stages. Guided by this realization, alloying species are released with high temporal precision to selectively target growth stages before and after coalescence completion. Pre-coalescence deployment of all alloying agents yields a more pronounced 2D growth morphology, which for the case of Cu, Al, and Au is achieved without compromising the Ag-layer electrical conductivity. A more complex behavior is observed when alloying atoms are deposited during the post-coalescence growth stages: Cu, Au, Al, and Cr favor 2D morphology, while Ti and Mo yield a more pronounced three-dimensional morphological evolution. The overall results presented herein show that targeted deployment of alloying agents constitutes a generic platform for designing bespoken heterostructures between metal layers and technologically relevant weakly interacting substrates.& nbsp;Published under an exclusive license by the AVS. en
dc.format.extent 9
dc.language.iso eng
dc.relation.ispartof Journal of vacuum science & technology : an official journal of the American Vacuum Society
dc.rights unspecified
dc.rights.uri info:eu-repo/semantics/openAccess
dc.subject 114 Physical sciences
dc.title Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species en
dc.type Article
dc.contributor.organization Department of Physics
dc.description.reviewstatus Peer reviewed
dc.relation.doi https://doi.org/10.1116/6.0001700
dc.relation.issn 0734-2101
dc.rights.accesslevel openAccess
dc.type.version acceptedVersion

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