TY  -  
T1  - Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond 
SN  -  /  
UR  - http://hdl.handle.net/10138/338719 
T3  -  
A1  - Mattinen, Miika; Leskelä, Markku; Ritala, Mikko 
A2  -  
PB  -  
Y1  - 2021 
LA  - eng 
AB  - 2D transition metal dichalcogenides (TMDCs) are among the most exciting materials of today. Their layered crystal structures result in unique and useful electronic, optical, catalytic, and quantum properties. To realize the technological potential of TMDCs, methods depositing uniform films of controlled thickness at low temperatures in a highly controllable, scalable, and repeatable manner are needed. Atomic layer deposition (ALD) is a chemical gas-phase thin film deposition method capable of me... 
VO  -  
IS  -  
SP  -  
OP  -  
KW  - 2D materials; atomic layer deposition; catalysis; electronics; energy storage; transition metal dichalcogenides; 116 Chemical sciences 
N1  -   
PP  -  
ER  -