TY  -  
T1  - Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition 
SN  -  /  
UR  - http://hdl.handle.net/10138/325623 
T3  -  
A1  - Hämäläinen, Jani; Mizohata, Kenichiro; Meinander, Kristoffer; Mattinen, Miika; Vehkamäki, Marko; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku 
A2  -  
PB  -  
Y1  - 2018 
LA  - eng 
AB  - Abstract Rhenium is both a refractory metal and a noble metal that has attractive properties for various applications. Still, synthesis and applications of rhenium thin films have been limited. We introduce herein the growth of both rhenium metal and rhenium nitride thin films by the technologically important atomic layer deposition (ALD) method over a wide deposition temperature range using fast, simple, and robust surface reactions between rhenium pentachloride and ammonia. Films are grown and... 
VO  -  
IS  -  
SP  -  
OP  -  
KW  - atomic layer deposition (ALD); rhenium; rhenium nitrides; thin films; AMMONIA-SYNTHESIS; CATALYSTS; 114 Physical sciences 
N1  -   
PP  -  
ER  -