TY  -  
T1  - Self-Aligned Thin-Film Patterning by Area-Selective Etching of Polymers 
SN  -  /  
UR  - http://hdl.handle.net/10138/334604 
T3  -  
A1  - Zhang, Chao; Leskelä, Markku; Ritala, Mikko 
A2  -  
PB  - Multidisciplinary Digital Publishing Institute 
Y1  - 2021 
LA  -  
AB  - Patterning of thin films with lithography techniques for making semiconductor devices has been facing increasing difficulties with feature sizes shrinking to the sub-10 nm range, and alternatives have been actively sought from area-selective thin film deposition processes. Here, an entirely new method is introduced to self-aligned thin-film patterning: area-selective gas-phase etching of polymers. The etching reactions are selective to the materials underneath the polymers. Either O<sub>2</sub> ... 
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