Title: | Atomic Layer Deposition of High Permittivity Oxides : Film Growth and In Situ Studies |
Author: | Rahtu, Antti |
Contributor: | University of Helsinki, Faculty of Science, Department of Chemistry |
Publisher: | Helsingin yliopisto |
Date: | 2002-09 |
URI: |
http://urn.fi/URN:ISBN:952-10-0646-3
http://hdl.handle.net/10138/21065 |
Thesis level: | Doctoral dissertation |
Rights: | This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited. |
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