Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies

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Use this URL to link or cite this item: http://urn.fi/URN:ISBN:952-10-0646-3

Title:	Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies
Author:	Rahtu, Antti
Contributor:	University of Helsinki, Faculty of Science, Department of Chemistry
Thesis level:	Doctoral dissertation
URI:	URN:ISBN:952-10-0646-3 http://hdl.handle.net/10138/21065
Date:	2002-09
Copyright information:	This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited.

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