Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies
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http://urn.fi/URN:ISBN:952-10-0646-3| Title: | Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies |
| Author: | Rahtu, Antti |
| Contributor: | University of Helsinki, Faculty of Science, Department of Chemistry |
| Thesis level: | Doctoral dissertation |
| URI: |
URN:ISBN:952-10-0646-3
http://hdl.handle.net/10138/21065 |
| Date: | 2002-09 |
| Rights: | This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited. |
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