Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies

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http://urn.fi/URN:ISBN:952-10-0646-3
Title: Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies
Author: Rahtu, Antti
Contributor: University of Helsinki, Faculty of Science, Department of Chemistry
Thesis level: Doctoral dissertation
URI: URN:ISBN:952-10-0646-3
http://hdl.handle.net/10138/21065
Date: 2002-09
Rights: This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited.


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